The goal of SGAN-Next is to develop a European GaN on SiC MMIC process for high frequency operating devices (Q band and beyond) targeting flexible payloads for LEO/GEO applications
The main objective of the SGAN-Next project is the development of an European GaN on SiC MMIC foundry process and demonstrate outstanding performance at high frequency with the design of efficient and robust SSPA, LNA and switch devices. For this purpose, the project includes an industrial foundry (UMS), an epitaxy manufacturer (SweGaN) and a research foundry (FBH) that will work in process improvement to boost performance. Moreover, the consortium includes the two main European satellite prime contractors (ADS and TAS), a satellite equipment manufacturer (SENER) and two Universities (UNIBO and UAB) with expertise in SSPA research and microwave electron device characterization and modelling